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THIS IS A COMBINED SOURCES SOUGHT NOTICE AND NOTICE OF INTENT TO SOLE SOURCE Announcement Number: NIST-SS26-CHIPS-120 Subject: Notice of Intent to Noncompetitively Acquire Tilt Stage for SEM This notice is not a request for a quotation. A solicitation document will not be issued, and quotations will not be requested. This acquisition is being conducted under the authority of RFO 12.102(a). The North American Industry Classification System (NAICS) code for this acquisition is 334516, Analytical Laboratory Instrument Manufacturing. NIST intends to award a non-competitive contract to Kleindiek, Inc. for a tilt stage for NIST's Zeiss Supra SEM. BACKGROUND The National Institute of Standards and Technology (NIST) Microsystems and Nanotechnology Division (MND) develops integrated microsystems by advancing the state of the art in nanofabrication, enabling the transfer of NIST measurement technologies to the industrial, academic, and government communities. The MND owns a Zeiss Supra SEM that serves CHIPS Metrology project GC6.01 – Universal Microscopy Standards. To meet mission-critical requirements, the MND needs to procure a tilt-stage upgrade for this microscope. This acquisition will provide the Division and CHIPS Metrology with essential capabilities for calibration and measurement method development, assessment of nanofabrication processes, and characterization of microscopy standards. Scanning electron microscopy (SEM) is a critical tool for semiconductor manufacturing metrology. NIST is developing standards and methods for calibrating the landing angle of an electron beam in scanning electron microscopy. Such calibration is critical to ensure dimensional accuracy for a variety of metrology applications, such as overlay assessment. The standards consist of arrays of nanostructures, the images of which exhibit features that depend on the relative angle of the electron beam and the sample, and the nanostructure geometry. The realization of standards that are fit for dissemination requires careful decoupling of all sources that affect the measurement of the electron beam landing angle. These sources include the angle of the electron beam, the orientation of the sample in the SEM, and the nanostructure geometry. In particular, assessment of the effects of fabrication processes on nanostructure geometry requires control over the orientation of the sample relative to the electron beam in all three Euler angles. Such control is not possible with the current stage installed on the Zeiss Supra SEM, requiring a stage upgrade to access the additional degrees of freedom. Without this ability, a primary objective of the project to deliver standards for electron beam goniometry to stakeholders cannot be realized. The minimum requirements are outlined below. Line Item 0001: Line Item 0001: Description: Tilt stage for a Zeiss Supra SEM Quantity: 1 Technical Specifications The tilt stage must function as a substage attachment that can be routinely installed an…

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