This is a sources sought notice. The purpose of this notice is to conduct market research and identify potential sources of commercial products/services that satisfy the Government's anticipated needs. NIST is seeking responses from all responsible sources, including large and small businesses. The North American Industry Classification System (NAICS) code for this acquisition is 333242– Semiconductor Machinery Manufacturing, with a Small Business Size Standard of 1,500 employees. This notice does not constitute a Request for Proposal (RFP), Request for Quotation (RFQ), Invitation for Bids (IFB), or any commitment by the Government to issue a solicitation or award a contract. The National Institute of Standards and Technology (NIST) will not pay for any information submitted in response to this notice. Submission of information is voluntary and will not result in any obligation on the part of the Government. NO SOLICITATION DOCUMENTS EXIST AT THIS TIME Requests for solicitation documents will not receive a response. Respondents shall clearly mark any proprietary or restricted information. In the absence of such markings, NIST will assume unlimited rights to all technical data submitted. BACKGROUND The semiconductor supply chain is global, specialized, and interconnected. Chipmakers do business with thousands of individual suppliers that provide the highly complex materials and tools used to produce semiconductors. To address the lack of full visibility into the semiconductors markets supply chain and R&D ecosystem gaps NIST will conduct the measurement science, or metrology, critical to the development of new materials, packaging, and production methods in chip manufacturing. The Chemical Process and Nuclear Measurements Group is seeking an Atomic Layer Deposition (ALD) Batch Reactor to support a CHIPS R&D Metrology project focused on characterizing the stability of biofunctional semiconductor interfaces in chip-based biosensors. The reactor will be used to fabricate metal oxide and self-assembled monolayer (SAM) interfaces on 200 mm wafer substrates, which will then be subjected to interface stability and failure analyses using advanced metrology developed at NIST. The ALD reactor is a critical component of this program, aimed at understanding the impact of metal oxide and SAM deposition recipes on biosensor performance and lifetime, and ultimately accelerating biosensor development and improving manufacturing processes critical for commercial viability. DESCRIPTION OF REQUIREMENT The contractor shall deliver a quantity of one (1) ALD Batch Reactor inclusive of warranty and FOB Destination delivery that meets all minimum technical specifications identified below: Technical Specifications for Hardware Wafer size: Small pieces, up to and including 200 mm Wafer heating: Room temperature to 300 °C (or higher) Wafer uniformity: 1% or better thickness uniformity for Al2O3 on Si (one standard deviation) Chamber heating: Independent of wafer, warm …